This equipment is used on the surface of the product through E-beam, Ion beam glass, film, back shell, lens product, AF film, AR film, color film equipment.

• The installation of electron gun (E / Beam) makes it possible to dissolve high temperature materials by beams and to easily deposit metals and compounds.
• Ion beam (I / Beam) is installed to enable ion assisted deposition and substrate cleaning (contaminants, moisture) Available.
• Deposition thickness can be controlled by using crystal oscillation thickness meter.
• The deposition thickness control during the process minimizes the thickness variation due to the coating chemicals using a uniformity mask.